Gyeonggi-do, South Korea

Jae-Hun Jung

USPTO Granted Patents = 3 

Average Co-Inventor Count = 6.6

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015-2017

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3 patents (USPTO):Explore Patents

Title: Innovations of Jae-Hun Jung

Introduction

Jae-Hun Jung is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of technology, particularly in application control and external device management. With a total of 3 patents to his name, Jung continues to push the boundaries of innovation.

Latest Patents

One of his latest patents focuses on controlling applications according to connection state and execution condition. This invention relates to managing application execution in user equipment. It involves receiving a user request for executing an application, obtaining an execution condition associated with the requested application, and detecting whether the user equipment is connected to an external device. The execution of the requested application is then controlled based on the detection result and the obtained execution condition.

Another significant patent by Jung is centered on controlling an external device connected to user equipment. This method includes obtaining external device information from the connected device, acquiring application information based on this external device information, and running an application tailored for the external device based on the obtained application information.

Career Highlights

Jae-Hun Jung is currently employed at Kt Corporation, where he applies his expertise in technology and innovation. His work has been instrumental in developing solutions that enhance user experience and device interaction.

Collaborations

Jung collaborates with talented individuals such as You-Jin Kang and Shin-Hyuk Kang, contributing to a dynamic and innovative work environment.

Conclusion

Jae-Hun Jung's contributions to technology through his patents demonstrate his commitment to innovation and excellence. His work continues to influence the way applications and external devices interact, paving the way for future advancements.

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