This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Dongjin Semichem Co., Ltd.. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Jae Hong Yoo: Innovator in Chemical-Mechanical Polishing Technology
Introduction
Jae Hong Yoo is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of chemical-mechanical polishing (CMP) technology. His innovative work focuses on enhancing the efficiency and quality of polishing processes used in semiconductor manufacturing.
Latest Patents
Jae Hong Yoo holds a patent for a chemical-mechanical polishing particle and polishing slurry composition. This patent, which is designed to exhibit a high polishing rate and quality, addresses the common issues of defects and scratches that can occur during the polishing process. The modified surface of the CMP particles plays a crucial role in achieving these improvements.
Career Highlights
Jae Hong Yoo is associated with Dongjin Semichem Co., Ltd., a company known for its advancements in semiconductor materials and processes. His work at the company has positioned him as a key player in the development of innovative polishing solutions.
Collaborations
Some of Jae Hong Yoo's notable coworkers include Weoun Gyuen Moon and Jae Hyun Kim. Their collaborative efforts contribute to the ongoing research and development in the field of chemical-mechanical polishing.
Conclusion
Jae Hong Yoo's contributions to CMP technology reflect his commitment to innovation and quality in semiconductor manufacturing. His patent and work at Dongjin Semichem Co., Ltd. highlight his role as a significant inventor in this specialized field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile