Jae Ho Guahk

Title: Jae Ho Guahk: Innovator in Plasma Processing Technology

Introduction

Jae Ho Guahk is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a patented apparatus that enhances the efficiency and reliability of substrate processing.

Latest Patents

Jae Ho Guahk holds a patent for an "Apparatus for plasma processing and method for plasma processing." This invention provides a substrate supporter capable of securely holding a substrate, such as a wafer, which has a predetermined thin film pattern. The apparatus is designed to remove various impurities from the rear surface of the substrate. It includes at least one arm and a supporting portion that extends toward the substrate seating position. This design reduces the likelihood of arc discharges compared to conventional dry etching methods, thereby increasing process yield and product reliability.

Career Highlights

Jae Ho Guahk is associated with Charm Engineering Co., Ltd., where he continues to advance his research and development efforts in plasma processing technology. His work has been instrumental in improving the stability and efficiency of substrate mounting in various applications.

Collaborations

He collaborates with talented individuals such as Kyung Ho Lee and Jae Chul Choi, contributing to a dynamic team focused on innovation in the field.

Conclusion

Jae Ho Guahk's contributions to plasma processing technology exemplify the impact of innovative thinking in engineering. His patented apparatus not only enhances processing efficiency but also ensures greater reliability in substrate handling.