Gyeonggi-do, South Korea

Jae Gon Choi

This inventor holds 1 USPTO granted patent. Top assignees: Enpulse Co., Ltd., Skhynix Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae Gon Choi. Retrieved from https://idiyas.com/inventor/jae-gon-choi-4ddk22kl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jae Gon Choi and Semiconductor Polishing Pad Innovation.

Introduction

Jae Gon Choi is an inventor associated with Gyeonggi-do, South Korea. His patent work addresses polishing-pad reuse in semiconductor manufacturing, with the goal of extending pad life and improving process efficiency.

Latest Patents

Choi is associated with 1 patent: “Method for Refreshing Polishing Pad and Method for Manufacturing Semiconductor Device Using the Same.” The invention describes refreshing a polishing pad to restore its polishing performance after its usual period of use. Reusing the pad can reduce discarded material, shorten replacement time, and improve polishing efficiency. The disclosed semiconductor-device manufacturing method applies this refreshing process to reduce pad replacements while maintaining performance comparable to a new pad.

Career Highlights

Choi’s listed company affiliations include SK hynix Inc. and Enpulse Co., Ltd. His patent reflects an effort to address both manufacturing productivity and the useful life of materials used in semiconductor polishing.

Collaborations

His listed coworkers include Sung Hoon Yun and Jang Won Seo. Their names are associated with Choi’s professional and patent-related context.

Conclusion

Jae Gon Choi’s patent focuses on refreshing and reusing semiconductor polishing pads, offering a potential way to reduce waste and replacement downtime while supporting efficient manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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