Jae-eung Oh

Title: Innovations of Jae-eung Oh in Vapor Deposition Technology

Introduction

Jae-eung Oh is a prominent inventor based in New York, NY (US). She has made significant contributions to the field of vapor deposition technology. With a focus on enhancing the efficiency and effectiveness of vapor deposition reactors, her work has garnered attention in the industry.

Latest Patents

Jae-eung Oh holds a patent for a vapor deposition reactor. This innovative reactor features a configuration that allows a substrate and the reactor to move in a non-contact state. This design enables the substrate to pass by the reactor, while an injection unit and an exhaust unit are installed as basic modules. These modules are responsible for receiving a precursor or reactant and for pumping a purge gas, respectively. The reactor's small-size inlet contributes to achieving homogeneous film properties and improves the deposition efficiency of precursors. Additionally, it reduces the time required for the purge and pumping process. The reactor is designed to reflect each step of Atomic Layer Deposition (ALD), eliminating the need for a valve. Furthermore, it facilitates the application of remote plasma, the use of super high frequencies including microwave, and UV irradiation.

Career Highlights

Jae-eung Oh is currently associated with Synos Technology, Inc., where she continues to innovate in the field of vapor deposition technology. Her work is characterized by a commitment to advancing the capabilities of vapor deposition reactors.

Collaborations

Due to space constraints, the collaborations section has been omitted.

Conclusion

Jae-eung Oh's contributions to vapor deposition technology exemplify her innovative spirit and dedication to improving industrial processes. Her patent for a vapor deposition reactor showcases her ability to enhance efficiency and effectiveness in this critical area of technology.