Daejeon, South Korea

Jae-Chul Lee

This inventor holds 1 USPTO granted patent. Top assignee: Rpm Tech Co., Ltd.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae-Chul Lee. Retrieved from https://idiyas.com/inventor/jae-chul-lee-i3rc9t22

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Innovations of Jae-Chul Lee in Valve Technology

Introduction

Jae-Chul Lee is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of valve technology, particularly with his innovative sensing device. His work focuses on simplifying mechanical structures while enhancing performance and durability.

Latest Patents

Jae-Chul Lee holds a patent for a "Detecting device for valve opening-closing." This device is designed to sense the opening degree of a valve without the need for upper and lower limit switches. By eliminating these components, the device simplifies the mechanical structure, making it easier to install, maintain, and repair. It also improves the sensing performance and reduces costs associated with manufacturing and long-term durability.

Career Highlights

Throughout his career, Jae-Chul Lee has been associated with Rpm Tech Co., Ltd., where he has contributed to various innovative projects. His expertise in valve technology has positioned him as a key figure in the industry.

Collaborations

Jae-Chul Lee has worked alongside talented colleagues such as Byoung-Hoo Rho and Mun-Su Bok. Their collaborative efforts have further advanced the development of innovative technologies in their field.

Conclusion

Jae-Chul Lee's contributions to valve technology exemplify the importance of innovation in engineering. His patented device not only enhances performance but also reduces costs and improves durability.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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