Suwon, South Korea

Jae Cheol Heo

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2015-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae Cheol Heo. Retrieved from https://idiyas.com/inventor/jae-cheol-heo-7o3qsj6g

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015-2018

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2 patents (USPTO):Explore Patents

Title: Innovations by Jae Cheol Heo

Introduction

Jae Cheol Heo is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of image processing technology. With a total of 2 patents to his name, Heo continues to push the boundaries of innovation.

Latest Patents

His latest patents include an image processing board and a display apparatus having the same. The image processing board features a substrate with common input terminals and an additional input terminal that can be selectively installed based on the type of display apparatus. This design allows the image processing board to be utilized across various types of display devices, showcasing its versatility and adaptability.

Career Highlights

Jae Cheol Heo is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of technological advancements in display and image processing.

Collaborations

He has collaborated with notable coworkers such as Young Dae Kim and Do Yong Kim, contributing to various projects that enhance the capabilities of display technologies.

Conclusion

Jae Cheol Heo's innovative work in image processing and display technology exemplifies the spirit of invention. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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