Annecy, France

Jacques Morel

This inventor holds 2 USPTO granted patents. Top assignee: Compagnie Industrielle Des Telecommunications Cit-Alcatel. Active years: 1985-1986.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1985-1986

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Jacques Morel: Innovator in Helium Leak Detection Technology

Introduction

Jacques Morel is a notable inventor based in Annecy, France, recognized for his contributions to the field of helium leak detection technology. With a total of two patents to his name, Morel has developed innovative methods and apparatuses that enhance the efficiency and accuracy of leak detection processes.

Latest Patents

Morel's latest patents include a method of depolluting a helium leak detector and an apparatus for measuring and displaying leakage rates in a tracer gas. The method of depolluting a helium leak detector involves a sophisticated pumping station and gas analyzer system designed to ensure thorough testing of leak detection equipment. The apparatus for measuring leakage rates features a primary vacuum pump and a motor-controlled inlet valve, which allows for precise control and monitoring of leakage flow rates.

Career Highlights

Jacques Morel is associated with Compagnie Industrielle des Telecommunications Cit-Alcatel, where he has applied his expertise in developing advanced leak detection technologies. His work has significantly contributed to improving the reliability of leak detection systems in various industrial applications.

Collaborations

Morel collaborates with fellow inventor Jacques Tallon, working together to push the boundaries of innovation in their field. Their combined efforts have led to advancements that benefit the industry as a whole.

Conclusion

Jacques Morel's innovative work in helium leak detection technology showcases his commitment to enhancing industrial processes. His patents reflect a deep understanding of the technical challenges in this area and provide solutions that are both effective and efficient.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…