Sindelfingen, Germany

Jacques Hummel

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jacques Hummel. Retrieved from https://idiyas.com/inventor/jacques-hummel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Jacques Hummel: Innovator in Server Rack Technology

Introduction

Jacques Hummel is a notable inventor based in Sindelfingen, Germany. He has made significant contributions to the field of server rack systems, particularly with his innovative designs that enhance efficiency and functionality.

Latest Patents

Hummel holds a patent for a "Passive rear door for controlled hot air exhaust." This invention pertains to a server rack system that includes a server rack, a raised floor cooling system, and an exhaust system. The design features adjustable exhaust channels that allow for the effective management of hot air, ensuring optimal performance of the server rack.

Career Highlights

Hummel is associated with the International Business Machines Corporation (IBM), where he has applied his expertise in developing advanced server technologies. His work has been instrumental in improving cooling systems and exhaust management in server environments.

Collaborations

Throughout his career, Hummel has collaborated with notable colleagues, including Marc Griffel and Michael K Schaefer. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the industry.

Conclusion

Jacques Hummel's contributions to server rack technology exemplify the impact of innovative thinking in the tech industry. His patent for a passive rear door for controlled hot air exhaust showcases his commitment to enhancing system efficiency and performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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