Ascot, Canada

Jacques Hallée

This inventor holds 1 USPTO granted patent. Top assignee: University of Ontario Institute of Technology. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jacques Hallée. Retrieved from https://idiyas.com/inventor/jacques-hallée

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Innovations of Jacques Hallée

Introduction

Jacques Hallée is an innovative inventor based in Ascot, California. He has made significant contributions to the field of technology, particularly with his unique inventions aimed at enhancing user experience.

Latest Patents

One of Jacques Hallée's notable patents is a portable rest device for laptop computers. This device is made of a thermally-conductive material and features a top face designed to receive the laptop computer. The bottom of the device incorporates a heat-dissipating three-dimensional pattern. This innovative design allows the device to effectively dissipate heat generated by both the laptop and the user, providing a more comfortable experience.

Career Highlights

Jacques Hallée is affiliated with the University of Ontario Institute of Technology, where he continues to contribute to research and development in technology. His work focuses on creating practical solutions that address common issues faced by laptop users.

Collaborations

Jacques has collaborated with notable colleagues, including Richard J. Marceau and Réal Brousseau. Their combined expertise fosters an environment of innovation and creativity.

Conclusion

Jacques Hallée's contributions to technology, particularly through his portable rest device for laptops, showcase his commitment to improving user comfort and functionality. His work continues to inspire advancements in the field of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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