Châtenay-Malabry, France

Jacques Ancelle

This inventor holds 1 USPTO granted patent. Top assignee: Office National D'etudes Et De Recherches Aerospatiales. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jacques Ancelle. Retrieved from https://idiyas.com/inventor/jacques-ancelle

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Jacques Ancelle: Innovator in Silane-Type Coupling Agents

Introduction

Jacques Ancelle is a notable inventor based in Châtenay-Malabry, France. He has made significant contributions to the field of chemical engineering, particularly in the development of silane-type coupling agents. His work has implications for various industrial applications, showcasing the importance of innovation in material science.

Latest Patents

Jacques Ancelle holds a patent for a silane-type coupling agent, which includes a process for its preparation and its use. This patent represents a key advancement in the field, providing new methods for enhancing the properties of materials through chemical coupling.

Career Highlights

Throughout his career, Ancelle has been associated with the Office National d'Études et de Recherches Aérospatiales (ONERA). His role at this prestigious research institution has allowed him to engage in cutting-edge research and development, contributing to advancements in aerospace technology.

Collaborations

Jacques Ancelle has collaborated with esteemed colleagues such as Bertrand Bloch and Claude Andrieux. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

In summary, Jacques Ancelle is a distinguished inventor whose work on silane-type coupling agents has made a significant impact in the field of chemical engineering. His contributions continue to influence advancements in material science and aerospace technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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