Venlo, Netherlands

Jacobus G Van Enckevort

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Oce-Technologies B.v.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jacobus G Van Enckevort. Retrieved from https://idiyas.com/inventor/jacobus-g-van-enckevort

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Jacobus G Van Enckevort: Innovator in Hot Melt Ink Technology

Introduction

Jacobus G Van Enckevort is a notable inventor based in Venlo, Netherlands. He has made significant contributions to the field of ink technology, particularly with his innovative hot melt ink composition. His work has implications for various applications in printing and manufacturing.

Latest Patents

Jacobus holds 1 patent for his invention related to hot melt ink. The patent discloses a hot melt ink composition that contains a substantially non-aqueous carrier composition, at least one dye from the anthrapyridone series, and an organic sulfonic acid compound. Additionally, the patent outlines a method for preparing this hot melt ink composition, showcasing his expertise in chemical formulations.

Career Highlights

Jacobus is currently employed at Oce-Technologies B.V., a company known for its advancements in printing technology. His role at Oce-Technologies allows him to further develop and refine his innovative ideas in the field of ink technology.

Collaborations

Throughout his career, Jacobus has collaborated with talented individuals such as Kim C Jansen and Peter M A Wetjens. These collaborations have likely contributed to the development and success of his innovative projects.

Conclusion

Jacobus G Van Enckevort is a distinguished inventor whose work in hot melt ink technology exemplifies innovation in the printing industry. His contributions continue to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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