Company Filing History:
Years Active: 1978-1983
Title: Jacob W Lin: Innovator in Dielectric Materials
Introduction
Jacob W Lin is a notable inventor based in Bloomington, MN (US). He has made significant contributions to the field of materials science, particularly in the development of advanced dielectric materials. With a total of 4 patents to his name, Lin's work has implications for various technological applications.
Latest Patents
One of Lin's latest patents is titled "Plasma polymerized ethane for interlayer dielectric." This invention involves a plasma polymerized ethane thin film that has been discovered to serve as an improved interlayer dielectric. The material boasts high dielectric strength and a unique low dielectric constant. Additionally, it offers advantages such as being pinhole-free, crack-resistant, and providing good step coverage at a low deposition cost.
Another significant patent is related to "Technique of introducing an interface layer in a thermoplastic." This invention presents an improved method for adding an insulative layer between the thermoplastic layer and the photoconductive layer in thermoplastic photoconductive holographic recording mediums. The added layer, made of pure PVK, is electrically insulating at the thermal development temperatures, which helps prevent decaying charge contrast during hologram development.
Career Highlights
Jacob W Lin is currently employed at Honeywell GmbH, where he continues to innovate and develop new materials. His work at Honeywell has allowed him to apply his expertise in dielectric materials to real-world applications, contributing to the company's advancements in technology.
Collaborations
Lin has collaborated with several talented individuals in his field, including Tzuo-Chang Lee and Kuo H Chang. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Jacob W Lin is a prominent inventor whose work in dielectric materials has the potential to impact various industries. His innovative patents and contributions to Honeywell GmbH highlight his commitment to advancing technology.