Honeywell G.m.b.h.

Jacob W Lin

Tzuo-Chang Lee

Kuo H Chang

Leslie S Weinman

A plasma polymerized ethane thin film deposited on a variety of substrates has been discovered to be an improved interlayer dielectric. It is a material having property of high dielectric strength and unique low dielectric constant. It also has advantages of depositing pinhole free, crack resistant with good step coverage and low deposition cost.

Plasma polymerized ethane for interlayer dielectric

This invention pertains to an improved technique of introducing an added insulative layer between the thermoplastic layer and the photoconductive layer of the thermoplastic photoconductive holographic recording medium. The added layer (pure PVK) is electrically insulating at temperatures used for thermal development to prevent decaying charge contrast during hologram development.

Technique of introducing an interface layer in a thermoplastic

In a thermoplastic-photoconductor holographic recording medium in the form of several transparent layers over a transparent substrate, such as an optically transparent electrically conductive layer, then a photoconductor layer and a thermoplastic layer over such as glass or Mylar, a conventional material such as gold or platinum has been used as a transparent conductive layer. It is desired to use a less precious metal such as nickel-chromium (NiCr) as the conductive layer, however a limitation has been found in that an unwanted dark charge injection occurs from the NiCr to the photoconductive layer. This causes poor charge acceptance and therefore results in poor halogram formation. Herein a mono atom thick layer of the NiCr is treated and becomes on oxide layer which forms an effective charge blocking layer to dark charge injection.

Element for thermoplastic recording

This invention pertains to an improved thermoplastic holographic recording medium having an added layer between the thermoplastic layer and the photoconductor layer. The added layer is electrically insulating at temperatures used for thermal development to prevent decaying charge contrast during hologram development.

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Bloomington, MN, United States of America

Jacob W Lin