This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Jacob J Orbon, Jr: Innovator in Lithography Pattern Writing Systems
Introduction
Jacob J Orbon, Jr. is a notable inventor based in Morgan Hill, CA (US). He has made significant contributions to the field of lithography, particularly in the categorization of defects in semiconductor manufacturing processes. His innovative approach has led to the development of a unique patent that addresses systematic defects in lithography pattern writing systems.
Latest Patents
Jacob J Orbon, Jr. holds a patent for a design-based method for grouping systematic defects in lithography pattern writing systems. This patent, which is categorized under methods and apparatus for categorizing defects on workpieces, such as semiconductor wafers and masks, provides a novel way to analyze and categorize defects. By examining the layout surrounding a defect and matching it to similar defected neighborhoods across different locations on the die, defects can be categorized based on the common structures in which they occur. This innovative method enhances the efficiency and accuracy of semiconductor manufacturing.
Career Highlights
Jacob J Orbon, Jr. is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display technology sectors. His work at Applied Materials has allowed him to apply his expertise in lithography and contribute to advancements in the industry. With a total of 1 patent, he has established himself as a valuable asset in the field of semiconductor technology.
Collaborations
Throughout his career, Jacob has collaborated with talented individuals such as Youval Nehmadi and Ofer Bokobza. These collaborations have fostered innovation and have contributed to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Jacob J Orbon, Jr. is a distinguished inventor whose work in lithography pattern writing systems has made a significant impact on semiconductor manufacturing. His innovative patent and contributions to Applied Materials, Inc. highlight his dedication to advancing technology in this critical field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile