Company Filing History:
Years Active: 1994-1997
Title: Jacky Mathias: Innovator in Thin Layer Structures
Introduction
Jacky Mathias is a notable inventor based in Jargeau, France. He has made significant contributions to the field of thin layer structures, particularly in the areas of real-time quantification and measurement techniques. With a total of 2 patents, his work has implications for various applications, including semiconductors and integrated circuits.
Latest Patents
Jacky Mathias's latest patents include a method and device for in situ real-time quantification of the morphology and thickness of localized areas of surface layers in thin layer structures. This innovative method involves directing a beam of white light and one or two laser beams onto a sample within a vacuum treatment chamber. By utilizing a monochromator for spectral analysis and differential interferometry, the technique allows for the determination of the thickness and the instantaneous rate of variation of the surface layer. This technology is particularly useful for controlling vacuum treatment processes in thin layer structures.
Another significant patent is an assembly for simultaneous observation and laser interferometric measurements of articles contained in an enclosure. This assembly includes a video camera and a laser emitter unit, which consists of two laser diodes that follow the optical path of the video camera. The entire system is designed to facilitate the observation and measurement of thin-film structures, especially integrated-circuit boards.
Career Highlights
Jacky Mathias is currently employed at Sofie, where he continues to develop innovative solutions in his field. His expertise in thin layer structures has positioned him as a key figure in advancing measurement techniques that enhance the quality and efficiency of semiconductor manufacturing.
Collaborations
Jacky collaborates with Jean Canteloup, contributing to the development of cutting-edge technologies in their respective fields.
Conclusion
Jacky Mathias is a prominent inventor whose work in thin layer structures has led to significant advancements in measurement techniques. His contributions are vital for the ongoing evolution of semiconductor technology and integrated circuits.