Location History:
- Del Mar, CA (US) (2001 - 2014)
- Cardiff By The Sea, CA (US) (2011 - 2014)
- Durham, NC (US) (2009 - 2021)
Company Filing History:
Years Active: 2001-2021
Title: Jack J Mock: Innovator in Electromagnetic Radiation Absorption
Introduction
Jack J Mock is a notable inventor based in Durham, NC (US), recognized for his contributions to the field of electromagnetic radiation absorption. With a total of 11 patents to his name, Mock has made significant advancements in technology that have implications across various industries.
Latest Patents
Among his latest patents is an innovative apparatus and method for providing a selectively absorbing structure. This apparatus is designed to selectively absorb electromagnetic radiation and includes a conducting surface, a dielectric layer formed on the conducting surface, and a plurality of conducting particles distributed on the dielectric layer. The dielectric layer can be constructed from a material and thickness chosen to yield a specific absorption spectrum. Additionally, the thickness or dielectric value of the material can change in response to an external stimulus, thereby altering the absorption spectrum.
Career Highlights
Throughout his career, Jack J Mock has worked with prestigious institutions such as the University of California and Duke University. His work has not only contributed to academic research but has also paved the way for practical applications in technology.
Collaborations
Some of his notable coworkers include David R Smith and Sheldon Schultz, who have collaborated with him on various projects and research initiatives.
Conclusion
Jack J Mock's innovative work in the field of electromagnetic radiation absorption showcases his expertise and dedication to advancing technology. His contributions continue to influence the industry and inspire future innovations.