Lombard, IL, United States of America

Jack J Hsu

This inventor holds 1 USPTO granted patent. Top assignee: Pittway Corporation. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jack J Hsu. Retrieved from https://idiyas.com/inventor/jack-j-hsu-roob4tca

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Jack J Hsu: Innovator in Low Profile Detection Technology

Introduction

Jack J Hsu is a notable inventor based in Lombard, IL (US). He has made significant contributions to the field of detection technology. With a focus on innovation, he has developed a unique patent that showcases his expertise and creativity.

Latest Patents

Jack J Hsu holds a patent for a low profile detector. This invention represents a significant advancement in detection technology, providing enhanced functionality and efficiency. His innovative approach has the potential to impact various applications in the industry.

Career Highlights

Jack is currently employed at Pittway Corporation, where he continues to work on innovative projects. His role at the company allows him to apply his skills and knowledge in a practical setting. With a strong commitment to advancing technology, he has established himself as a valuable asset to his team.

Collaborations

Jack has collaborated with Kenneth R Fenne, a fellow innovator. Their partnership has fostered a creative environment that encourages the development of new ideas and solutions. Together, they have contributed to the advancement of detection technology.

Conclusion

Jack J Hsu is a dedicated inventor whose work in low profile detection technology exemplifies his innovative spirit. His contributions to Pittway Corporation and the field at large highlight his commitment to advancing technology. Through his patent and collaborations, he continues to make a significant impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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