Jack J Holt

Jack J Holt is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of photographic elements through his innovative patents. With a total of 3 patents to his name, Holt's work has had a lasting impact on the industry.

Latest Patents

Holt's latest patents include advancements in antistatic layers for photographic elements. One of his notable inventions is a coating composition for applying a vanadium pentoxide antistatic layer on a photographic element. This composition comprises from about 0.02 to about 0.08 percent by weight of vanadium pentoxide and a cellulose acetate binder polymer with an acetyl content ranging from about 15 percent to about 35 percent by weight. The solvent mixture in this composition includes a combination of C1-C2 dialkyl ketone, C1-C4 alkanol, and water. Another significant patent involves antistat coating compositions and antistat layers formed therefrom, which include a V2O5 antistat layer designed to prevent precipitation of the V2O5 in the presence of film base.

Career Highlights

Holt has spent a considerable part of his career at Eastman-Kodak Company, where he has been able to apply his innovative ideas in practical settings. His work has contributed to the development of new technologies that enhance the quality and functionality of photographic products.

Collaborations

Throughout his career, Holt has collaborated with notable coworkers such as Raymond T Jones and Charles T Havens. These collaborations have allowed for the exchange of ideas and the development of groundbreaking technologies in the field.

Conclusion

Jack J Holt's contributions to the field of photographic elements through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and inspire future innovations.