This inventor holds 1 USPTO granted patent. Top assignee: Massachusetts Institute of Technology. Active years: 1981.
Company Filing History:
Years Active: 1981
Title: Jack I Raffai: Innovator in Dielectric Isolation Technology
Introduction
Jack I Raffai is a notable inventor based in Lexington, MA (US). He has made significant contributions to the field of semiconductor technology, particularly in dielectric isolation processes. His innovative work has led to advancements that enhance the performance and efficiency of electronic circuits.
Latest Patents
Raffai holds a patent for a process titled "Dielectric isolation using shallow oxide and polycrystalline silicon." This invention describes a method that combines polycrystalline isolation of collectors with shallow oxide isolation of bases. The approach provides deep dielectric isolation, surface planarity, and high density of walled emitter geometries, which were previously unattainable by other means. The isolation scheme has been effectively utilized in the fabrication of ECL gate chains. The transistors are situated in 2.5-micron thick n-epi islands, surrounded by polysilicon that has been selectively oxidized with silicon nitride masking. The oxide bump at the nitride mask typically measures 3000 Å, while the epi-poly step height can be as small as 2600 Å. The circuits incorporate polysilicon resistors and are fabricated using both thermal diffusion and ion implantation techniques. Notably, the power-delay product of these circuits is approximately half that of junction isolated circuits.
Career Highlights
Raffai's career is marked by his association with the Massachusetts Institute of Technology, where he has contributed to various research initiatives. His work has been instrumental in advancing semiconductor technologies and improving circuit designs.
Collaborations
One of his notable collaborators is Stephen E Bernacki, with whom he has worked on various projects related to semiconductor innovations.
Conclusion
Jack I Raffai's contributions to dielectric isolation technology have significantly impacted the field of electronics. His innovative patent showcases his expertise and commitment to advancing semiconductor technology.