This inventor holds 1 USPTO granted patent. Top assignee: Sandia Corporation. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: The Innovative Contributions of Jack F. Jones, II
Introduction
Jack F. Jones, II is an accomplished inventor based in Albuquerque, NM (US). He has made significant contributions to the field of protective garments, particularly in the context of military and safety applications. His innovative designs focus on enhancing the safety of individuals exposed to explosive threats.
Latest Patents
Jones holds a patent for an armored garment designed to protect against the dangers posed by explosive devices. This lightweight protective garment is specifically engineered to shield an arm or leg from blast superheated gases, blast overpressure shock, shrapnel, and spall from devices such as Rocket Propelled Grenades (RPGs) or roadside Improvised Explosive Devices (IEDs). The garment features a ballistic sleeve made from aramid fiber, such as KEVLAR®, which prevents thermal burns while providing protection from fragments. Additionally, it incorporates two or more rigid armor inserts made of a carbon/epoxy composite laminate, ensuring protection against high-velocity projectiles.
Career Highlights
Jack F. Jones, II is associated with Sandia Corporation, where he applies his expertise in developing advanced protective technologies. His work has been instrumental in creating solutions that enhance the safety of military personnel and first responders.
Collaborations
Throughout his career, Jones has collaborated with notable colleagues, including James Wayne Purvis and Larry D. Whinery. These partnerships have contributed to the advancement of innovative protective technologies.
Conclusion
Jack F. Jones, II's contributions to the field of protective garments exemplify the importance of innovation in enhancing safety against explosive threats. His patented designs reflect a commitment to protecting individuals in high-risk environments.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
