Rotterdam, Netherlands

Jaap H A Smits

This inventor holds 1 USPTO granted patent. Top assignee: Oce-Technologies B.v.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jaap H A Smits. Retrieved from https://idiyas.com/inventor/jaap-h-a-smits

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Jaap H A Smits: Innovator in Hot Melt Ink Technology

Introduction

Jaap H A Smits is a notable inventor based in Rotterdam, Netherlands. He has made significant contributions to the field of ink technology, particularly with his innovative patent related to hot melt ink. His work has implications for various applications in printing and manufacturing.

Latest Patents

Jaap H A Smits holds a patent for a hot melt ink composition. This ink is solid at room temperature and transforms into a liquid at elevated temperatures. The composition includes a substantially non-aqueous carrier and at least one dye, formed by at least one salt of the anthrapyridone series. This innovation enhances the versatility and performance of ink in various applications.

Career Highlights

Smits is associated with Oce-Technologies B.V., a company known for its advancements in printing technology. His role at Oce-Technologies has allowed him to explore and develop innovative solutions in the field of ink formulations.

Collaborations

Jaap H A Smits has collaborated with notable colleagues, including Frederik L E M Suilen and Marcus P L Huinck. These collaborations have contributed to the development of cutting-edge technologies in the printing industry.

Conclusion

Jaap H A Smits is a prominent figure in the field of ink technology, with a focus on hot melt ink innovations. His contributions through patents and collaborations continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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