Ja-Hun Byeon

Title: Ja-Hun Byeon: Innovator in Photoresist Technology

Introduction

Ja-Hun Byeon is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of photoresist technology, particularly in the development of materials used in the fabrication of thin film transistor substrates. His innovative work has implications for the electronics industry, especially in display technologies.

Latest Patents

Ja-Hun Byeon holds a patent for a photoresist composition and method of fabricating a thin film transistor substrate. The patent describes a photoresist composition designed for digital exposure, which includes a binder resin made from a novolak resin and a specific compound. Additionally, it incorporates a photosensitizer that consists of a diazide-based compound and a solvent. This invention enhances the efficiency and effectiveness of the manufacturing process for electronic components.

Career Highlights

Ja-Hun Byeon is currently employed at Samsung Display Co., Ltd., a leading company in the display technology sector. His role involves research and development, where he applies his expertise in photoresist materials to advance the company's product offerings. His work is crucial in ensuring that Samsung remains at the forefront of display innovation.

Collaborations

Ja-Hun Byeon collaborates with talented colleagues, including Sang-Hyun Yun and Woo-Seok Jeon. Together, they work on various projects that aim to push the boundaries of current technologies in the display industry.

Conclusion

Ja-Hun Byeon's contributions to photoresist technology and his role at Samsung Display Co., Ltd. highlight his importance in the field of electronics. His innovative patent reflects a commitment to advancing technology and improving manufacturing processes.