The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 29, 2014

Filed:

Nov. 18, 2009
Applicants:

Sang-hyun Yun, Suwon-si, KR;

Woo-seok Jeon, Seoul, KR;

Jung-in Park, Suwon-si, KR;

Hi-kuk Lee, Yongin-si, KR;

Byung-uk Kim, Hwaseong-si, KR;

Dong-min Kim, Hwaseong-si, KR;

Seung-ki Kim, Hwaseong-si, KR;

Ja-hun Byeon, Hwaseong-si, KR;

Inventors:

Sang-Hyun Yun, Suwon-si, KR;

Woo-Seok Jeon, Seoul, KR;

Jung-In Park, Suwon-si, KR;

Hi-Kuk Lee, Yongin-si, KR;

Byung-Uk Kim, Hwaseong-si, KR;

Dong-Min Kim, Hwaseong-si, KR;

Seung-Ki Kim, Hwaseong-si, KR;

Ja-Hun Byeon, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/022 (2006.01); G03F 7/023 (2006.01); H01L 29/66 (2006.01); H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0236 (2013.01); H01L 29/66765 (2013.01);
Abstract

The present invention relates to a photoresist composition for digital exposure and a method of fabricating a thin film transistor substrate. The photoresist composition for digital exposure includes a binder resin including a novolak resin and a compound represented by the chemical formula (1), a photosensitizer including a diazide-based compound, and a solvent:


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