Company Filing History:
Years Active: 1986-1988
Title: J William Ward: Innovator in Ion Beam Lithography
Introduction
J William Ward is a notable inventor based in Canoga Park, CA (US). He has made significant contributions to the field of ion beam lithography, holding a total of 3 patents. His work has advanced the technology used in semiconductor manufacturing, showcasing his expertise and innovative spirit.
Latest Patents
One of his latest patents is the "Masked Ion Beam Lithography System and Method." This invention presents a compact and economical alternative to traditional ion implantation devices. The system utilizes an H.sup.+ ion beam extracted from a source, which is transmitted through two lenses that accelerate the ions to energies between 200-300 keV. The design allows for a reduced column length while maintaining effective beam focus and collimation, ultimately enhancing the exposure of resist on semiconductor substrates.
Another significant patent is the "Hybrid Focused-Flood Ion Beam System and Method." This system operates in two modes: a flooded beam mode for rapid throughput and a focused ion beam mode for high-resolution patterning. The ability to switch between these modes is facilitated by a lens that modifies beam collimation, allowing for detailed patterning that is not achievable in the flooded mode.
Career Highlights
J William Ward has had a distinguished career at Hughes Aircraft Company, where he has applied his innovative ideas to develop advanced technologies in ion beam lithography. His work has not only contributed to the company's success but has also influenced the broader field of semiconductor manufacturing.
Collaborations
Throughout his career, Ward has collaborated with notable colleagues, including John L Bartelt and Robert L Seliger. These partnerships have fostered an environment of innovation and have led to the development of groundbreaking technologies in their field.
Conclusion
J William Ward's contributions to ion beam lithography exemplify his role as a leading inventor in the semiconductor industry. His patents reflect a commitment to innovation and efficiency, making a lasting impact on the technology used in modern manufacturing processes.