The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 1986
Filed:
Apr. 07, 1983
J William Ward, Canoga Park, CA (US);
Victor Wang, Agoura, CA (US);
Richard P Vahrenkamp, Newberry Park, CA (US);
Robert L Seliger, Agoura, CA (US);
Hughes Aircraft Company, El Segundo, CA (US);
Abstract
Focused ion beam microfabrication column (10) produces an ion beam from ion source (12), focuses the beam by objective lens (24) onto the plane of electrode (36). ExB filter (44) separates out the ion species at a low energy portion of the beam. The beam of selected species is first accelerated by energy central lens (38) which has a controllable potential for controlling the final beam energy to the target. The beam is accelerated by final accelerator lens (54) and is demagnified and focused on the target by that lens. Beam deflector (64) deflects the beam for programmed ion beam work on the target (60).