J Rex Runyon

Title: J Rex Runyon: Innovator in Wafer Inspection Technology

Introduction

J Rex Runyon is a notable inventor based in Fremont, CA, who has made significant contributions to the field of wafer inspection technology. With a total of 2 patents, his work focuses on enhancing the accuracy and efficiency of defect detection in semiconductor manufacturing.

Latest Patents

Runyon's latest patents include innovative methods for detecting defects on a wafer using template image matching. This technology involves matching a template image, where certain pixels are linked to regions in the device with varying characteristics, to the output of an electron beam inspection system. By applying defect detection parameters to these pixels based on their location, Runyon's invention significantly improves the ability to identify defects on wafers. Another notable patent is for an air bearing used in substrate inspection devices. This tool features a head for investigating the substrate and a chuck that positions the upper surface of the substrate close to the tool head. The air bearing, equipped with both a pressure and a vacuum source, ensures that the substrate is held at a precise distance from the tool head, facilitating accurate registration relative to the upper surface of the substrate.

Career Highlights

Runyon's career is marked by his role at Kla Tencor Corporation, where he has been instrumental in developing advanced inspection technologies. His expertise in the field has led to innovations that are widely recognized in the semiconductor industry.

Collaborations

Throughout his career, Runyon has collaborated with talented individuals such as Xing Chu and Jan A Lauber, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

J Rex Runyon's contributions to wafer inspection technology exemplify his commitment to advancing the semiconductor industry. His patents reflect a deep understanding of the challenges in defect detection and showcase his innovative spirit.