Plymouth, MN, United States of America

J Michael Hoch


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 328(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: J Michael Hoch: Innovator in Subcutaneous Electrode Implantation

Introduction

J Michael Hoch is a notable inventor based in Plymouth, MN (US). He has made significant contributions to the field of medical technology, particularly in the area of subcutaneous electrode implantation. His innovative approach has led to the development of a specialized tool that enhances the efficiency and effectiveness of surgical procedures.

Latest Patents

Hoch holds a patent for an "Insertion and tunneling tool for a subcutaneous wire patch electrode." This tool is designed for the subcutaneous implantation of wire patch electrode segments through a single surgical incision. The tunneling tool consists of a stylet and a peel-away sheath, which work together to create a subcutaneous tunnel for the electrode segment. Once the tunneling tool reaches the desired position, the stylet is withdrawn, allowing for the insertion of the electrode segment into the tunnel. This process can be repeated as necessary, accommodating various electrode segment sizes and patient needs. Additionally, the tool can be constructed in a curved configuration to facilitate implantation in the lateral thoracic region of the body.

Career Highlights

Hoch is associated with Cardiac Pacemakers, Inc., where he applies his expertise in medical device innovation. His work has contributed to advancements in cardiac care and patient treatment options.

Collaborations

Hoch has collaborated with notable colleagues, including Roger W Dahl and James D Kadera. Their combined efforts have furthered the development of innovative medical technologies.

Conclusion

J Michael Hoch's contributions to the field of medical technology, particularly through his patented tunneling tool, demonstrate his commitment to improving patient care. His work continues to influence the landscape of subcutaneous electrode implantation.

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