Petal, MS, United States of America

J M Sewell, Jr

This inventor holds 1 USPTO granted patent. Top assignee: Oreck Holdings, LLC. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: J M Sewell, Jr. Retrieved from https://idiyas.com/inventor/j-m-sewell-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: J M Sewell, Jr: Innovator in Floor Care Technology

Introduction

J M Sewell, Jr. is a notable inventor based in Petal, MS (US). He has made significant contributions to the field of floor care technology. With a focus on practical solutions, Sewell has developed innovations that enhance the efficiency and effectiveness of cleaning devices.

Latest Patents

Sewell holds a patent for a "Containment member for floor care apparatus." This invention addresses the need for improved containment systems in floor care devices, ensuring better performance and user satisfaction. His innovative approach has led to the development of a product that meets the demands of modern cleaning needs.

Career Highlights

Currently, J M Sewell, Jr. is associated with Oreck Holdings, LLC, a company known for its commitment to quality in the floor care industry. His work at Oreck has allowed him to apply his inventive skills in a practical setting, contributing to the company's reputation for excellence.

Collaborations

Sewell has collaborated with talented individuals such as Chris M Paterson and Shane P Cohen. These partnerships have fostered a creative environment that encourages innovation and the development of new ideas in floor care technology.

Conclusion

J M Sewell, Jr. is a dedicated inventor whose work has made a lasting impact on the floor care industry. His patent and contributions to Oreck Holdings, LLC highlight his commitment to innovation and quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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