This inventor holds 2 USPTO granted patents. Top assignees: The University of Texas System, University of Illinois. Active years: 2003-2011.
Company Filing History:
Years Active: 2003-2011
Title: J Craig Dutton: Innovator in Electromagnetic Flow Control
Introduction
J Craig Dutton is a notable inventor based in Urbana, IL (US). He has made significant contributions to the field of electromagnetic flow control, holding 2 patents that showcase his innovative approach to engineering challenges.
Latest Patents
Dutton's latest patents include "Electromagnetic flow control, methods and uses" and "Method and apparatus for control of shock/boundary-layer interactions." The first patent describes a method for actuation that utilizes a conducting material with electrolyte particles, which are electrically charged within electromagnetic fields in boundary layers. This innovative approach allows for the generation of control forces applicable in various scenarios. The second patent focuses on an apparatus designed to manage shock and boundary-layer interactions caused by supersonic shocks on structural surfaces. It features a cavity with an opening, a plate covering the opening, and flaps that respond to airflow conditions, effectively controlling airflow based on the state of the surrounding environment.
Career Highlights
Throughout his career, Dutton has worked with prestigious institutions such as the University of Illinois and the University of Texas System. His work in these organizations has allowed him to further develop his research and contribute to advancements in engineering and technology.
Collaborations
Dutton has collaborated with esteemed colleagues, including Eric Loth and Philippe H Geubelle. Their combined expertise has likely enhanced the quality and impact of their research endeavors.
Conclusion
J Craig Dutton's innovative work in electromagnetic flow control and boundary-layer interactions demonstrates his significant contributions to engineering. His patents reflect a deep understanding of complex systems and a commitment to advancing technology.

