Izumi, Japan

Iwao Uenoyama

This inventor holds 1 USPTO granted patent. Top assignee: Osaka Oxygen Ind Ltd.. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Iwao Uenoyama. Retrieved from https://idiyas.com/inventor/iwao-uenoyama-6nu2jct7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: Iwao Uenoyama: Innovator in Ozone Removal Technology

Introduction

Iwao Uenoyama is a notable inventor based in Izumi, Japan. He has made significant contributions to the field of environmental technology, particularly in the area of ozone removal.

Latest Patents

Uenoyama holds a patent for a process designed to remove ozone from an ozone-containing gas. This innovative process involves treating the gas with a molded product obtained through specific steps, showcasing his expertise in addressing environmental challenges.

Career Highlights

Iwao Uenoyama is associated with Osaka Oxygen Industries Ltd., where he has applied his knowledge and skills to develop effective solutions for gas treatment. His work has been instrumental in advancing technologies that contribute to cleaner air.

Collaborations

Uenoyama has collaborated with notable colleagues, including Zenzi Hagiwara and Hiroo Ishino. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Iwao Uenoyama's contributions to ozone removal technology highlight his commitment to environmental sustainability. His innovative processes and collaborations with fellow experts continue to make a positive impact in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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