Company Filing History:
Years Active: 2011
Title: Iwao Mihara: Innovator in Polishing Technology
Introduction
Iwao Mihara is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of polishing technology, particularly through his innovative patent that enhances the efficiency and effectiveness of polishing pads.
Latest Patents
Mihara holds a patent for a polishing pad and its production method. This invention provides a polishing pad that exhibits excellent polishing stability and slurry retainability during the polishing process. It effectively prevents a reduction in polishing rate and excels in flattening substrates to be polished. The production method involves dispersing water-soluble particles, such as β-cyclodextrin, into a crosslinking agent like polypropylene glycol to create a dispersion. This dispersion is then mixed with a polyisocyanate, such as 4,4'-diphenylmethane diisocyanate, and reacted to obtain a polishing pad with the water-soluble particles evenly distributed in the matrix.
Career Highlights
Iwao Mihara is associated with JSR Corporation, where he continues to develop innovative solutions in the polishing industry. His work has been instrumental in advancing the technology used in various applications, ensuring high-quality results in polishing processes.
Collaborations
Mihara has collaborated with notable colleagues, including Fujio Sakurai and Yoshinori Igarashi. Their combined expertise has contributed to the development of advanced polishing technologies.
Conclusion
Iwao Mihara's contributions to polishing technology through his innovative patent demonstrate his commitment to enhancing industrial processes. His work continues to influence the field, showcasing the importance of innovation in achieving superior results.