Untersiggenthal, Switzerland

Ivan Luketic

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 68(Granted Patents)


Company Filing History:


Years Active: 2001-2018

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3 patents (USPTO):Explore Patents

Title: Ivan Luketic: Innovator in Contoured Hole Production

Introduction

Ivan Luketic is a notable inventor based in Untersiggenthal, Switzerland. He has made significant contributions to the field of manufacturing, particularly in the production of contoured holes. With a total of three patents to his name, Luketic's work showcases his innovative approach to engineering challenges.

Latest Patents

Luketic's latest patents include a method for producing contoured holes and a method for the parametric production of drilled cooling holes. The first patent describes a technique for manufacturing a contoured hole in a wall, which involves creating a non-penetrating hole that connects to a through hole. This method ensures precision in the manufacturing process while maintaining the integrity of the wall structure. The second patent focuses on the parametric production of drilled holes, specifically for components like gas or steam turbine blades. This method involves measuring the actual wall thickness and adjusting the drilled-hole geometry accordingly, enhancing the efficiency and effectiveness of the drilling process.

Career Highlights

Throughout his career, Ivan Luketic has worked with prominent companies such as ABB Research Ltd. and Alstom Technology Limited. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.

Collaborations

Luketic has collaborated with notable professionals in his field, including Michael Blöchlinger and Klaus Semmler. These partnerships have further enriched his work and expanded the impact of his inventions.

Conclusion

Ivan Luketic stands out as an inventive force in the manufacturing industry, with his patents reflecting a commitment to innovation and precision. His contributions continue to influence the field and inspire future advancements in technology.

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