Mountain View, CA, United States of America

Ivan Lavolic


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2005-2007

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2 patents (USPTO):

Title: Innovations of Ivan Lavolic

Introduction

Ivan Lavolic is a notable inventor based in Mountain View, CA. He has made significant contributions to the field of lithography, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of lithography systems, which are crucial in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Lithography mask utilizing asymmetric light source." This invention describes a method of reflective lithography that involves directing an asymmetric radiation beam onto a reticle. The asymmetry in the radiation beam compensates for a non-zero angle of incidence, allowing for improved output from the reticle. The radiation source can be configured using various methods, including configurable reflective devices or suitable mirrors and lenses.

Another significant patent is the "Method and system for monitoring EUV lithography mask flatness." This patent discloses a method for monitoring the flatness of extreme ultraviolet (EUV) lithography masks. The system utilizes a capacitance probe to scan the EUV mask, generating elevation data that helps create a flatness profile. This innovation is essential for ensuring the precision required in advanced lithography processes.

Career Highlights

Ivan Lavolic is currently employed at Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work at AMD has allowed him to contribute to cutting-edge technologies that drive the industry forward.

Collaborations

Throughout his career, Ivan has collaborated with notable colleagues, including Bruno M LaFontaine and Cyrus E Tabery. These collaborations have fostered innovation and have been instrumental in the development of advanced lithography techniques.

Conclusion

Ivan Lavolic's contributions to lithography through his patents and work at Advanced Micro Devices Corporation highlight his role as a significant inventor in the field. His innovations continue to impact the semiconductor industry positively.

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