Holon, Israel

Itzhack Segev

This inventor holds 1 USPTO granted patent. Top assignee: Irt Inspection Research and Technologies Ltd.. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Itzhack Segev. Retrieved from https://idiyas.com/inventor/itzhack-segev

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Itzhack Segev: Innovator in Data Acquisition and Processing

Introduction

Itzhack Segev is a notable inventor based in Holon, Israel. He has made significant contributions to the field of data acquisition and processing. His innovative work focuses on developing methods and apparatuses that enhance the analysis of materials.

Latest Patents

Itzhack Segev holds a patent for an "Apparatus and method for data acquisition and processing." This invention features a programmable receiver designed to detect signals reflected from or transmitted through materials. The technology allows for the analysis of flaws within these materials. The receiver includes a circuit that divides signals into multiple independent sections, enabling selective evaluation of waveform portions contained in each section. This method provides a robust approach to detecting and analyzing flaws in various materials.

Career Highlights

Segev is associated with IRT Inspection Research and Technologies Ltd., where he applies his expertise in data acquisition. His work has been instrumental in advancing the capabilities of material analysis technologies.

Collaborations

Some of his notable coworkers include Abraham Aharoni and Tzach Livne, who contribute to the innovative environment at IRT Inspection Research and Technologies Ltd.

Conclusion

Itzhack Segev's contributions to data acquisition and processing exemplify the impact of innovation in material analysis. His patented technology represents a significant advancement in the field, showcasing his dedication to improving methods for detecting flaws in materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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