Kikuchi, Japan

Itsuo Araki


Average Co-Inventor Count = 1.5

ph-index = 1

Forward Citations = 16(Granted Patents)


Location History:

  • Kikuchi, JP (2004)
  • Kumamoto, JP (2010)

Company Filing History:


Years Active: 2004-2010

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Innovations of Itsuo Araki: A Pioneer in Plasma Technology

Introduction

Itsuo Araki is a notable inventor based in Kikuchi, Japan, recognized for his significant contributions to the field of plasma technology. With a total of three patents to his name, Araki's innovations have made a profound impact on the manufacturing processes of semiconductor components, particularly in the application of plasma etching devices.

Latest Patents

Among his latest patents, Araki developed a "Member for plasma etching device and method for manufacture thereof." This invention involves a member featuring a coating film of yttrium oxide or YAG with specific thickness and surface roughness parameters, designed to enhance plasma resistance. It effectively prevents abnormal etching caused by changes in electric properties, ensuring prolonged use even with large 12-inch silicon wafers.

Another notable patent is the "Vertical type wafer supporting jig." This innovation presents a simplified structure for supporting multiple wafers without the risk of a ring-like support plate falling off. The design utilizes support pillars with strategically formed support groove portions, allowing for optimal stacking and securing of wafers at predetermined intervals.

Career Highlights

Araki's career has included invaluable experiences at Shin-Etsu Quartz Products Ltd., where he honed his expertise in material science and semiconductor manufacturing technology. His work is pivotal in pushing the boundaries of plasma technology, greatly influencing the industry's operational methods.

Collaborations

Throughout his career, Araki collaborated closely with fellow inventor Kyoichi Inaki, leveraging their combined knowledge to drive technological advancements in their field. Their partnership has demonstrated the collaborative spirit essential for innovation in high-tech industries.

Conclusion

Itsuo Araki's contributions to plasma technology through his patented inventions reflect his commitment to enhancing manufacturing processes in the semiconductor industry. His innovative solutions not only address critical challenges in plasma etching but also lay the groundwork for future advancements in this rapidly evolving field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…