Company Filing History:
Years Active: 1996-1998
Title: Iton Wang: Innovator in Metal-to-Metal Antifuse Technology
Introduction
Iton Wang is a notable inventor based in San Jose, CA, who has made significant contributions to the field of integrated circuits. He holds 2 patents that focus on advanced methods of fabricating metal-to-metal antifuses, which are crucial components in modern electronic devices.
Latest Patents
Wang's latest patents include a method of fabricating metal-to-metal antifuse with improved diffusion and a metal-to-metal antifuse with an improved diffusion barrier layer. The first patent describes a metal-to-metal antifuse that consists of a lower electrode made from a first metal layer, a first barrier layer of TiW:N, a layer of antifuse material from amorphous silicon, a second barrier layer of TiW:N, and an upper electrode made from a second metal layer. The second patent similarly outlines the structure and components of the antifuse, emphasizing the innovative use of barrier layers to enhance performance in integrated circuits.
Career Highlights
Iton Wang is currently employed at Actel Corporation, Inc., where he continues to develop cutting-edge technologies in the semiconductor industry. His work has been instrumental in advancing the capabilities of antifuse technology, which plays a vital role in the functionality of integrated circuits.
Collaborations
Wang collaborates with Abdul R Forouhi, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the development of new ideas and technologies.
Conclusion
Iton Wang's contributions to the field of integrated circuits through his patents on metal-to-metal antifuses highlight his innovative spirit and technical expertise. His work at Actel Corporation, Inc. continues to influence the future of semiconductor technology.