Location History:
- Hadogaya, JP (2005)
- Yokohama, JP (1997 - 2011)
Company Filing History:
Years Active: 1997-2011
Title: **Innovative Contributions of Issey Tanaka: A Pioneer in Exposure Technology**
Introduction
Issey Tanaka, an accomplished inventor based in Yokohama, Japan, has made significant strides in the field of exposure technology. With a remarkable portfolio featuring 13 patents, Tanaka's work primarily revolves around the development of advanced exposure apparatuses crucial for manufacturing devices.
Latest Patents
Among Tanaka's notable patents is the innovative exposure apparatus and device manufacturing method. This apparatus utilizes an energy beam to illuminate a pattern, subsequently transferring it onto a substrate through a projection optical system. The system includes a substrate stage that supports the substrate and is capable of moving within a two-dimensional plane. An integral supply mechanism delivers liquid to a designated area between the projection optical system and the substrate, while a recovery mechanism efficiently collects this liquid after use. Furthermore, an auxiliary recovery mechanism ensures that any liquid not captured by the primary recovery system is reclaimed. This cutting-edge technology addresses the challenges of exposure conditions by incorporating an adjustment unit that modifies these conditions based on temperature data related to the liquid involved.
Career Highlights
Issey Tanaka's career has been closely associated with Nikon Corporation, where he has honed his skills in developing technologies that push the boundaries of device manufacturing. His contributions to the field have not only enhanced the functionality of exposure apparatuses but also improved efficiency in manufacturing processes.
Collaborations
Throughout his career, Tanaka has collaborated with esteemed colleagues such as Hiroyuki Hiraiwa and Shigeru Hirukawa. These partnerships have fostered a dynamic exchange of ideas, further enriching his contributions to the technological landscape.
Conclusion
Issey Tanaka stands out as a prominent figure in the realm of innovations related to exposure technology. His numerous patents and collaborative efforts demonstrate his commitment to advancing manufacturing methodologies, significantly impacting the industry and paving the way for future advancements.