The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2004
Filed:
Sep. 10, 2002
Applicant:
Inventors:
Takeshi Suzuki, Kawasaki, JP;
Issey Tanaka, Yokohama, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 9/00 ; G01B 9/00 ; G01N 2/141 ;
U.S. Cl.
CPC ...
G02B 9/00 ; G01B 9/00 ; G01N 2/141 ;
Abstract
In a projection optical system for projecting and transferring a pattern on a projection original R onto a photosensitive substrate W, one or a plurality of lenses having an in-homogeous radial refractive index about the optical axis are used, while one or a plurality of aspheric surfaces for correcting the aberration resulting from the in-homogeousness in refractive index of lenses are provided.
Suzuki, Takeshi. (2004). Illumination optical system and method of making exposure apparatus (U.S. Patent No. 6710930). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6710930
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile