Ibaraki, Japan

Issei Tobita

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.. Active years: 1991-1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Issei Tobita. Retrieved from https://idiyas.com/inventor/issei-tobita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 67(Granted Patents)


Location History:

  • Ibaraki, JP (1991)
  • Mito, JP (1995)

Company Filing History:


Years Active: 1991-1995

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Issei Tobita

Introduction

Issei Tobita, based in Ibaraki, Japan, is a prominent inventor recognized for his significant contributions to the field of electron beam technology. With two patents to his name, he has developed advanced apparatuses that enhance the capabilities of semiconductor device observation and mass spectrometry.

Latest Patents

Tobita's latest innovations include two notable patents:

1. **Electron Beam Apparatus**: This inventive apparatus comprises an electron beam source and a unit designed for irradiating the electron beam onto a specimen. It features a detector for secondary electrons, an electrode that generates an electric field for drawing secondary electrons out of recesses in the specimen, and a magnetic field generating unit for focusing those drawn electrons. This design allows for the observation of high aspect ratio contact holes in semiconductor devices which are characterized by small diameters and large depths.

2. **Composite Apparatus with Secondary Ion Mass Spectrometry Instrument**: This patent describes a sophisticated composite apparatus that integrates a secondary ion mass spectrometry instrument with a scanning electron microscope. It includes both a liquid metal ion source and another type of ion source, ensuring alignment of their emitted ion beams along a primary beam axis. A primary ion separating device mass-separates the ions, and an electron gun aligns with the ion beam, providing a comprehensive tool for advanced analysis.

Career Highlights

Issei Tobita has had an impressive career, notably working with leading companies such as Hitachi, Ltd. and Hitachi Instrument Engineering Co., Ltd. His professional journey reflects a deep commitment to innovation and excellence in research and development.

Collaborations

Throughout his career, Tobita has collaborated with esteemed colleagues, including Hiroshi Iwamoto and Tadashi Otaka. These partnerships have likely contributed to the advancement of technologies in their respective fields, showcasing the importance of collaboration in scientific endeavors.

Conclusion

Issei Tobita stands as a testament to the impact of innovative thinking in technology. His patents not only enhance our understanding of semiconductor devices but also contribute to advancements in mass spectrometry. As he continues to push the boundaries of technology in Ibaraki, Japan, the scientific community eagerly anticipates his future contributions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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