Higashiyamato, Japan

Isao Tanabe

This inventor holds 2 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 1984-1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isao Tanabe. Retrieved from https://idiyas.com/inventor/isao-tanabe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 78(Granted Patents)


Location History:

  • Higashiyamato, JP (1984)
  • Higashiyamatoshi, JP (1986)

Company Filing History:


Years Active: 1984-1986

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2 patents (USPTO):Explore Patents

Title: Isao Tanabe: Innovator in Semiconductor Technology

Introduction

Isao Tanabe is a notable inventor based in Higashiyamato, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods for circuit programming and photomask repair.

Latest Patents

Tanabe's latest patents include a groundbreaking invention titled "Circuit programming by use of an electrically conductive light shield." This invention involves a semiconductor integrated circuit device characterized by a circuit programming wiring layer formed on an insulating film on a semiconductor substrate. A light shielding protective mask material is deposited around the circuit programming wiring layer, except for the program part, enhancing the efficiency of circuit programming.

Another significant patent is the "Method and apparatus for redressing defective photomask." This invention outlines a method for repairing defect portions of a photomask using a complex material that can be deposited as a light shading material. The process involves irradiating a white defect region with a continuous wave laser light beam, converting the complex material into shading material. The method also includes removing undesired portions of the light shading film through pulse laser irradiation.

Career Highlights

Isao Tanabe has built a distinguished career at Hitachi, Ltd., where he has been instrumental in advancing semiconductor technologies. His innovative approaches have contributed to the development of more efficient electronic devices.

Collaborations

Tanabe has collaborated with notable colleagues, including Tateoki Miyauchi and Mikio Hongo, further enhancing the impact of his work in the semiconductor field.

Conclusion

Isao Tanabe's contributions to semiconductor technology through his patents and work at Hitachi, Ltd. highlight his role as a key innovator in the industry. His inventions continue to influence advancements in electronic devices and circuit programming.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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