Fuchu, Japan

Isao Onuma

This inventor holds 1 USPTO granted patent. Top assignee: Milestone Co., Ltd.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isao Onuma. Retrieved from https://idiyas.com/inventor/isao-onuma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Isao Onuma: Innovator in Silicon Wafer Manufacturing

Introduction

Isao Onuma is a notable inventor based in Fuchuu, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the production of silicon wafers. His innovative approach has led to the development of a patented method that enhances the efficiency of silicon wafer manufacturing.

Latest Patents

Isao Onuma holds a patent for a "Method for manufacturing silicon wafer and silicon wafer." This invention represents a crucial advancement in the semiconductor industry, providing improved techniques for producing high-quality silicon wafers.

Career Highlights

Onuma is currently employed at Milestone Co., Ltd., where he continues to work on innovative projects in semiconductor technology. His expertise and dedication to research have positioned him as a valuable asset to his company and the industry at large.

Collaborations

Isao Onuma collaborates with his coworker, Satoshi Do, to further enhance their research and development efforts. Their teamwork exemplifies the importance of collaboration in driving innovation within the technology sector.

Conclusion

Isao Onuma's contributions to silicon wafer manufacturing highlight his role as a key inventor in the semiconductor industry. His patented methods and ongoing work at Milestone Co., Ltd. demonstrate his commitment to advancing technology and innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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