Isao Momii

Title: Isao Momii - Innovator in Full-Contact Exposure Technology

Introduction

Isao Momii is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of exposure devices, particularly with his innovative full-contact type exposure device. His work has implications for various applications in the semiconductor industry.

Latest Patents

Isao Momii holds 1 patent for his invention of a full-contact exposure device. This device allows for high adherence of a photo mask with a board. Upon completion of prescribed processing, a controller manages a moving mechanism to elevate a platen, bringing the photo mask and board closer together. The device creates a sealed space between the two components. Simultaneously, the controller initiates vacuuming through a vacuum pump. This vacuum pressure creates a negative space between the photo mask and the board, causing the photo mask to bend downward, with its center area sagging to make contact with the board. The controller also regulates a cam drive mechanism to rotate cams while vacuuming, enabling the photo mask to gradually contact the board from the center to the periphery, effectively pushing out air and achieving full contact.

Career Highlights

Isao Momii is associated with Adtec Engineering Co., Ltd., where he continues to develop and refine his innovative technologies. His expertise in exposure devices has positioned him as a key figure in advancing manufacturing processes in the semiconductor sector.

Collaborations

Isao Momii has worked alongside Tsunesou Tajima, contributing to the development of cutting-edge technologies in their field.

Conclusion

Isao Momii's contributions to the field of exposure technology exemplify the importance of innovation in the semiconductor industry. His full-contact exposure device represents a significant advancement, showcasing his dedication to enhancing manufacturing processes.