Singapore, Singapore

Isao Kawasumi

This inventor holds 1 USPTO granted patent. Top assignees: Hoya Corporation, Hoya Electronics Singapore Pte. Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isao Kawasumi. Retrieved from https://idiyas.com/inventor/isao-kawasumi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: **Isao Kawasumi: Innovator in Semiconductor Device Manufacturing**

Introduction

Isao Kawasumi, an inventive mind based in Singapore, has made a mark in the field of semiconductor device manufacturing. With a focus on innovative material applications, he has contributed to advancing technology through his patents.

Latest Patents

Kawasumi holds a patent for a "Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device." This invention details a mask blank that includes a thin film made from silicon and nitrogen, designed for creating a transfer pattern on a transparent substrate. Through sophisticated methodologies such as X-ray photoelectron spectroscopy, Kawasumi has enhanced the characterization of materials, promoting efficiency in semiconductor manufacturing.

Career Highlights

Throughout his career, Isao Kawasumi has been associated with prominent companies, including Hoya Corporation and Hoya Electronics Singapore Pte. Ltd. His work at these institutions has involved collaboration on various advanced manufacturing techniques and semiconductor technologies.

Collaborations

Kawasumi has worked alongside esteemed colleagues, including Masahiro Hashimoto and Mariko Uchida. Together, they have fostered innovations within their industry, contributing to the development of cutting-edge semiconductor solutions.

Conclusion

Isao Kawasumi's pioneering contributions to semiconductor devices exemplify the impact of innovation in technology. His patent reflects a significant advancement in manufacturing processes and material science, showcasing his role as a vital contributor to the field. As technology continues to evolve, the implications of his work will likely resonate for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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