Mukou, Japan

Isamu Yamanaka

This inventor holds 1 USPTO granted patent. Top assignee: Dainippon Screen Seizo Kabushiki-Kaisha. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isamu Yamanaka. Retrieved from https://idiyas.com/inventor/isamu-yamanaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Isamu Yamanaka: Innovator in Printing Technology

Introduction

Isamu Yamanaka is a notable inventor based in Mukou, Japan. He has made significant contributions to the field of printing technology, particularly through his innovative designs and patents. His work has had a lasting impact on the industry.

Latest Patents

Yamanaka holds a patent for a photosensitive material holder for an upright printing machine. This invention features an upright photosensitive material holder plate that can be moved in one direction. It includes guide means that allow the top of the holder plate to incline rearwards when moved sideways. This design enhances the efficiency and functionality of printing machines.

Career Highlights

Yamanaka is associated with Dainippon Screen Seizo Kabushiki-kaisha, a leading company in the printing technology sector. His role at the company has allowed him to develop and refine his innovative ideas, contributing to advancements in the industry.

Collaborations

Throughout his career, Yamanaka has worked alongside talented individuals such as Fumihiko Nishida and Hiroshi Ijiri. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Isamu Yamanaka's contributions to printing technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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