Nagoya, Japan

Isamu Oguma

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Ngk Ceramic Device Co., Ltd., Ngk Insulators, Inc.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isamu Oguma. Retrieved from https://idiyas.com/inventor/isamu-oguma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Isamu Oguma: Innovator in Chip Component Manufacturing

Introduction

Isamu Oguma is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of chip component manufacturing. His innovative methods have paved the way for advancements in the industry.

Latest Patents

Oguma holds a patent for a chip component manufacturing method. This method enables the handling of multiple chip pieces while they are pasted to a sheet. It allows for the application of surface treatments to these chip pieces during the manufacturing process. The patent outlines a series of steps, including retaining a green sheet on a carrier sheet, cutting the green sheet, and applying surface treatments to exposed portions of the chip pieces.

Career Highlights

Throughout his career, Isamu Oguma has worked with prominent companies such as NGK Insulators, Inc. and NGK Ceramic Device Co., Ltd. His experience in these organizations has contributed to his expertise in chip component manufacturing.

Collaborations

Oguma has collaborated with notable coworkers, including Hidetake Ota and Takatomo Ogata. Their joint efforts have further enhanced the development of innovative manufacturing techniques.

Conclusion

Isamu Oguma's contributions to chip component manufacturing demonstrate his commitment to innovation and excellence in the field. His patented methods continue to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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