Saitama, Japan

Isamu Mouri


Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 307(Granted Patents)


Location History:

  • Ube, JP (1991)
  • Saitama, JP (2000 - 2010)

Company Filing History:


Years Active: 1991-2010

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5 patents (USPTO):Explore Patents

Title: The Innovative Mind of Isamu Mouri: A Pioneer in Semiconductor Cleaning Technologies

Introduction

Isamu Mouri, an accomplished inventor based in Saitama, Japan, has made significant strides in the field of semiconductor technology. With a total of five patents to his name, Mouri's work reflects a commitment to developing innovative solutions for industry challenges, particularly in the realm of cleaning and etching gases used in semiconductor fabrication.

Latest Patents

Mouri's most recent patent, titled "Gas for removing deposit and removal method using same," introduces a groundbreaking gas designed for deposit removal through a gas-solid reaction. This innovative gas features hypofluorite, a compound characterized by having at least one OF group in its molecular structure. This advancement allows for the effective removal of various deposits, facilitating a cleaner process that benefits the environment. The gas can serve as a cleaning agent for the interiors of semiconductor manufacturing apparatuses, comprising 1–100 volume % of hypofluorite. Additionally, it can be utilized as an etching gas, enabling precise removal of unwanted portions of films deposited on substrates, thereby enhancing manufacturing accuracy.

Career Highlights

Isamu Mouri has made significant contributions to the industry through his association with Central Glass Company, Limited. His work there emphasized his expertise in creating cleaning and etching gases, which are vital in the production of semiconductor devices. His innovative approaches and patents have pushed the boundaries of traditional methodologies, providing modern solutions that align with the industry's environmental goals.

Collaborations

Mouri has collaborated with notable associates such as Tetsuya Tamura and Mitsuya Ohashi. These partnerships have fostered a dynamic exchange of ideas and expertise, further driving Mouri's advancements in gas technology within semiconductor manufacturing.

Conclusion

Isamu Mouri stands as a testament to the spirit of innovation in the semiconductor industry. His patents not only reflect technical prowess but also an awareness of environmental responsibilities. Through his continuous efforts, Mouri is contributing to a cleaner, more efficient future in semiconductor manufacturing, solidifying his status as a leading inventor in this critical field.

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