London, United Kingdom

Isaiah Wates Cox

This inventor holds 1 USPTO granted patent. Top assignee: Borealis Technical Limited. Active years: 2007.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: The Innovations of Isaiah Wates Cox

Introduction

Isaiah Wates Cox is a notable inventor based in London, GB. He has made significant contributions to the field of materials science, particularly in the area of electron emissive properties. His innovative approach has led to the development of a unique method for inducing suitable band gaps in substances.

Latest Patents

Isaiah holds a patent for an invention titled "Artificial Band Gap." This patent describes a method for the induction of a suitable band gap and electron emissive properties into a substance. The process involves providing the substrate with a surface structure that corresponds to the interference of electron waves. Lithographic or similar techniques are employed, either directly onto a metal mounted on the substrate or onto a mold that is then used to impress the metal. A preferred embodiment of this invention includes the formation of a trench or series of nano-sized trenches in the metal. He has 1 patent to his name.

Career Highlights

Isaiah is currently associated with Borealis Technical Limited, where he continues to push the boundaries of innovation in his field. His work has garnered attention for its potential applications in various technological advancements.

Collaborations

Isaiah has collaborated with talented individuals such as Avto Tavkhelidze and Jonathan Sidney Edelson. These partnerships have contributed to the development and refinement of his innovative ideas.

Conclusion

Isaiah Wates Cox is a pioneering inventor whose work in the field of electron emissive properties is paving the way for future innovations. His contributions are significant and reflect his dedication to advancing technology.

Profile summary based on public USPTO records.
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