Brooklyn, NY, United States of America

Isaak Tsimberg

This inventor holds 1 USPTO granted patent. Top assignee: Eci Technology, Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isaak Tsimberg. Retrieved from https://idiyas.com/inventor/isaak-tsimberg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Isaak Tsimberg

Introduction

Isaak Tsimberg is a notable inventor based in Brooklyn, NY. He has made significant contributions to the field of electrochemistry, particularly in the area of copper plating. His work has led to advancements that are crucial for various industrial applications.

Latest Patents

Isaak Tsimberg holds a patent for the "Analysis of an auxiliary leveler additive in an acid copper plating bath." This innovative patent addresses the analysis of an auxiliary leveler additive that cannot be evaluated by conventional CVS methods. The analysis is conducted using cyclic voltammetry at a platinum rotating disk electrode, focusing on its effect on the anodic current at very positive potentials.

Career Highlights

Tsimberg is associated with ECI Technology, Inc., where he applies his expertise in electrochemistry. His work at the company has been instrumental in developing new methodologies for analyzing plating baths, which are essential for the manufacturing processes in various industries.

Collaborations

Isaak has collaborated with notable colleagues, including Michael Pavlov and Eugene Shalyt. These collaborations have fostered an environment of innovation and have contributed to the success of their projects.

Conclusion

Isaak Tsimberg's contributions to the field of electrochemistry and his innovative patent demonstrate his commitment to advancing technology in copper plating. His work continues to influence the industry and showcases the importance of research and development in creating effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…