This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Other. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Ioannis Orfanopoulos: Innovator in Ion Control Technologies
Introduction
Ioannis Orfanopoulos is a notable inventor based in Athens, Greece. He has made significant contributions to the field of ion control technologies, holding a total of 2 patents. His work focuses on innovative methods for managing gas flows and charged droplets within vacuum chambers.
Latest Patents
Orfanopoulos's latest patents include a guide apparatus for controlling ions. This apparatus features a vacuum compartment that allows for the jetting of gas in the form of a free jet stream containing entrained ions. The design ensures that a supersonic free jet is formed, which guides the entrained ions effectively. Another patent involves a charged droplets generating apparatus that utilizes a gas conduit for laminarization of gas flows. This technology enables the generation of charged droplets of liquid within a gas flow, enhancing control over the gas dynamics in vacuum environments.
Career Highlights
Throughout his career, Orfanopoulos has demonstrated a commitment to advancing ion control technologies. His innovative approaches have positioned him as a key figure in his field. His patents reflect a deep understanding of fluid dynamics and the behavior of gases under various conditions.
Collaborations
Orfanopoulos has collaborated with notable colleagues, including Dimitris Papanastasiou and Emmanuel Raptakis. These partnerships have contributed to the development of his innovative technologies and have fostered a collaborative environment for research and development.
Conclusion
Ioannis Orfanopoulos is a distinguished inventor whose work in ion control technologies has led to significant advancements in the field. His patents showcase his innovative spirit and dedication to improving gas flow management in vacuum systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile